Ключевые слова: HTS, YBCO, coated conductors, substrate Ni, fluorine process, fabrication, microstructure
Selvamanickam V., Hatzistergos M.S., Efstathiadis H.(hefstathiadis@uamail.albany.edu), Lifshin E., Kaloyeros A.E., Reeves J.L., Allen L.P.(lallen@epion.com), MacCrimmon R.
Ключевые слова: HTS, YBCO, coated conductors, substrate SrTiO3, MOCVD process, microstructure, critical current density, critical caracteristics, fabrication
Iijima Y., Nakamura Y., Saitoh T., Teranishi R., Tokunaga Y., Fuji H., Izumi T., Shiohara Y., Honjo T.
Ключевые слова: HTS, YBCO, coated conductors, MOD process, microstructure, critical current density, fabrication, critical caracteristics
Iijima Y., Shiohara Y., Aoki Y., Hasegawa T., Watanabe T., Maeda T., Honjo T., Yamada Y., Saito T., Hirabayashi I., Takahashi Y.*(k920112@sntl.swcc.co.jp))
Freyhardt H.C., Eickemeyer J., Donet S., Weiss F.(Francois.Weiss@inpg.fr), Chaudouet P., Beauquis S., Abrutis A., Usokin A.(usokin@umpsun1.gwdg.de), Selbmann D., Jimenez C.(jimenez@jipelec.com), Bruzek C.E.(Christian_Eric.Bruzek@nexans.com), Saugrain J.M.
Osamura K., Ono T., Hirabayashi I., Matsumoto K., Takechi A.(takechi@kumax.kyoto-u.ac.jp)
Ключевые слова: HTS, YBCO, coated conductors, substrate Ni, SOE process, cap layers, PLD process, microstructure, critical current density, fabrication, critical caracteristics
Ji B.K., Jung C., Park S., Jun B., Hong G., Park H., Kim C., Sun J. ex-sun@kaeri.re.kr), Kim H.S.(hskim@cnu.ac.kr)
Ключевые слова: HTS, YBCO, coated conductors, substrate Ni, SOE process, MOCVD process, microstructure, fabrication
Wozniak U., Linker G.(Gerhard.Linker@ifp.fzk.de), Geerk J.(Jochen.Greek@ifp.fzk.de)
Ключевые слова: HTS, YBCO, coated conductors, buffer layers, substrate Ni, substrate Ni-Cr, SOE process, magnetron sputtering, microstructure, fabrication
De Winter G.(griet.dewinter@rug.ac.be), Mahieu S.(stijin.mahieu@rug.ac.be), De Roeck I.(ilse.deroek@rug.ac.be), De Gryse R.(roger.degryse@rug.ac.be), Denul J.(jurgen.denul@bekaert.com)
Ключевые слова: coated conductors, buffer layers, substrate Hastelloy, HTS, REBCO, magnetron sputtering, microstructure
Ключевые слова: HTS, YBCO, coated conductors, buffer layers, substrate Ni, MOCVD process, microstructure, fabrication
Heinrich A.M., Woerz B.(Bernhard.Woerz@physik.uni-augsburg.de), Karl H.(helmut.Karl@physik.uni-augsburg.de), Stritzker B.(Bernd.Stritzker@physik.uni-augsburg.de)
Ключевые слова: HTS, coated conductors, substrate Ni-W, SOE process, fabrication, microstructure
Ключевые слова: coated conductors, substrate Ni, buffer layers, chemical solution deposition, fabrication, microstructure
Ключевые слова: HTS, coated conductors, buffer layers, magnetron sputtering, magnetron sputtering, YBCO, substrate Ni, microstructure, fabrication
Ключевые слова: HTS, YBCO, coated conductors, buffer layers, substrate Ni, chemical solution deposition, IBAD process, microstructure, fabrication
Akin Y., Hascicek Y.S., Sigmund W., Celik E., Aslanoglu Z., Arda L.(arda@magnet.fsu.edu)
Ключевые слова: HTS, coated conductors, buffer layers, chemical solution deposition, substrate Ni, YBCO, microstructure, fabrication
Akin Y., Hascicek Y.S., Aslanoglu Z., Okuyucu H.(okuyucu@gazi.edu.tr), Arda L., Heiba Z.K.(zein_kh@hotmail.com), El-Kawni M.I.(elkawani@magnet.fsu.edu), Tolliver J.C., Barnes P.N.
Ключевые слова: HTS, coated conductors, buffer layers, RABITS process, substrate Ni, chemical solution deposition, microstructure, REBCO, resistivity, fabrication
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